Universal and Nondestructive Direct Photolithography of Colloidal Quantum Dots Using Photocrosslinkable Polymer Blends (Adv. Funct. Mater. 10/2026)

Advanced Functional Materials 2026 Open access

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Authors: Jaeyeop Lee, Seon Lee Kwak, ChaeGwang Lim, Hyeonjun Lee, W. Jung, Byong Jae Kim, Jisu Han, Kyoungeun Lee, Yeyun Bae, Jiyoon Oh, Hyoung-Jun Kim, Keon Woo Kim
+4 more Byeong Guk Jeong, Jaehoon Lim, Do‐Hoon Hwang, Jeongkyun Roh
DOI: 10.1002/adfm.73798
Cited by: 1

Abstract

Direct Photolithography In their Research Article (10.1002/adfm.202520047), Jaehoon Lim, Do-Hoon Hwang, Jeongkyun Roh, and co-workers present a universal and nondestructive direct photolithography method that enables high-resolution quantum dot (QD) patterning without ligand exchange. By blending QDs with a photocrosslinkable polymer, this approach preserves optical properties while enhancing QD-LED efficiency and operational lifetime, paving the way for next-generation display technologies.

Fields of Study & Subjects

Nanofabrication and Lithography Techniques Quantum Dots Synthesis And Properties Organic Electronics and Photovoltaics

Publication details

Journal / source
Advanced Functional Materials
Publisher
Wiley
Volume
36
Issue
10
Publication date
1 February 2026
Language
EN