Atomic‐Termination‐Engineered Multi‐Orbital Coupling for CO 2 ‐ Assisted Photocatalytic CH 4 Oxidation

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Authors: Chen Sun, Yanping Gao, Fei Rao, Hequn Yang, Yuhang Yao, Y Z Zhang, S H Wang, Yanmin Jia, Lujun Zhu, Hengcong Tao, Mirabbos Hojamberdiev, Gangqiang Zhu
Cited by: 1
References: 53

Abstract

ABSTRACT Carbon dioxide (CO 2 )‐assisted CH 4 photo‐oxidation is a promising strategy for promoting the carbon cycle, yet it remains highly challenging due to inefficient charge separation and the limited active reaction sites. Regulating the terminal layers of semiconductors provides an effective strategy for tailoring surface active sites and tuning the electronic structure. Herein, we modulate the p ‐ d orbital hybridization in Bi 2 MoO 6 via atomic‐termination engineering, tailoring surface states to facilitate charge carrier transfer and molecular activation. The p ‐ p hybridization between Bi‐6 p and O‐2 p orbitals induced by [Bi 2 O 2 ] 2+ termination generates shallow surface states, enabling more efficient transport of charge carriers from the bulk to the surface. Meanwhile, the favorable orbital coupling between Bi‐6 p and C‐2 p orbitals at the interface between [Bi 2 O 2 ] 2+ termination and CO 2 promotes CO 2 activation by lowering the energy of its antibonding orbitals. As a result, the BO‐BMO and MO‐BMO photocatalysts achieve CO evolution rates of 285.36 and 93.32 µmol g −1 h −1 , respectively, under simulated solar light irradiation. This work demonstrates efficient CH 4 conversion using CO 2 as a soft oxidant through atomic‐scale termination control to engineer two distinct orbital‐coupling pathways. These findings provide a new theoretical foundation and experimental paradigm for the rational design of surface terminations and the optimization of catalytic reactions.

Fields of Study & Subjects

Advanced Photocatalysis Techniques CO2 Reduction Techniques and Catalysts Electrocatalysts for Energy Conversion

Publication details

Journal / source
Advanced Functional Materials
Publisher
Wiley
Volume
36
Issue
51
Publication date
26 May 2026
Language
EN