Submicron Patterning Techniques for Perovskite Optoelectronics From Materials Challenges to Scalable Device Integration (Advanced Optical Materials 6/2026)
Abstract
Perovskite Patterning This cover illustrates five emerging fabrication strategies for perovskite optoelectronics, including thermal deposition, nanoimprint patterning, inkjet printing, and laser ablation. At the center is direct photolithography, where photo-crosslinkable perovskite resins enable high-resolution, maskless patterning. Together, these methods highlight a versatile toolbox for scalable and integration-ready perovskite device manufacturing. More details can be found in the Research Article by Gun Young Jung, Yusin Pak, and co-workers (DOI: 10.1002/adom.202502624).
Fields of Study & Subjects
Perovskite Materials and Applications
Nanofabrication and Lithography Techniques
Advancements in Photolithography Techniques
Publication details
- Journal / source
- Advanced Optical Materials
- Volume
- 14
- Issue
- 6
- Publication date
- 1 February 2026
- Language
- EN