Development of a Pixelated STEM ‐In‐ SEM Detector for Microstructural Feature Characterization

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Authors: Julien Aubourg, Emmanuel Bouzy, J.J. Fundenberger, Julien Guyon, Yudong Zhang, Luc Morhain, Jean-Claude Ménard, Guillaume Brunetti, Antoine Guitton
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Abstract

The Scanning Transmission Electron Microscopy in a Scanning Electron Microscope (STEM-in-SEM) approach proposed in this work addresses the possibilities and limitations of a prototype developed for microstructural characterization in thin foils. The developed detector comprises a digital micromirror device (DMD) that can generate user-defined apertures for electron microscopy. As such, TEM-like characterizations are possible while minimizing the presence of artifacts that sometimes hinder analyses. In addition, the developed detector benefits from an On-Axis Transmission Kikuchi Diffraction (On-Axis TKD) geometry, allowing relatively fast diffraction pattern acquisition with a high signal-to-noise ratio. The experimental results demonstrate both the ability to obtain diffraction patterns and to image microstructural defects-including diffraction contrast to characterize dislocations-under adjustable bright-field and dark-field conditions. The proposed Pixelated STEM-in-SEM technique is part of a broader framework aimed at transferring TEM techniques to the Scanning Electron Microscope (SEM).

Fields of Study & Subjects

Electron and X-Ray Spectroscopy Techniques Advanced Electron Microscopy Techniques and Applications Force Microscopy Techniques and Applications

Publication details

Journal / source
Microscopy Research and Technique
Publication date
22 July 2026
Language
EN