Measurement of Surface Friction of MoS 2 on h‐BN and SiO 2 Substrates

Read full text
Authors: Youngchel Lee, Byungchae Han, Dongin Yang, Youkyoung Kim, Hyunki Kim, Minhyeong Woo, Minbaek Lee
Cited by: 1
References: 22

Abstract

The nanoscale friction of mechanically exfoliated molybdenum disulfide (MoS 2 ) on hexagonal boron nitride (h‐BN) and SiO 2 substrates is quantitatively compared using lateral force microscopy under dry nitrogen conditions. Friction force on MoS 2 /h‐BN consistently exhibits higher values with larger variation compared to MoS 2 /SiO 2 . This trend persists across a wide range of MoS 2 thicknesses (c.a. 2–30 nm) and shows little correlation with surface roughness. Force–distance curve measurements further reveal stronger adhesion for MoS 2 on h‐BN. These findings imply that, in the nanoscale friction regime, the direct interaction between the tip and the 2D flake serves as the dominant factor, outweighing the effects of surface roughness, thickness, or loading force. Our results provide critical insights into the fundamental mechanisms of nanoscale friction in 2D heterostructures.

Fields of Study & Subjects

Force Microscopy Techniques and Applications 2D Materials and Applications Adhesion Friction and Surface Interactions

Publication details

Journal / source
physica status solidi (RRL) - Rapid Research Letters
Publisher
Wiley
Volume
20
Issue
6
Publication date
1 June 2026
Language
EN