‘Irradiation‐Free’ Work‐Function Measurements in XPS
Abstract
ABSTRACT A method for improved work‐function measurements in‐situ to X‐ray photoelectron spectroscopy (XPS) is presented. The method is based on the combination of two techniques involving irradiation each, however with opposite irradiation artifacts. Results can thus be processed to provide work‐function values of high reliability. An estimate of the (systematic) error in each measuring technique is obtained as well. Thus, application to poorly conducting specimens and insulators is enabled, with which the extent and reliability of XPS‐derived information can be improved significantly, starting from the standard chemical analysis and ending in novel XPS‐based electrical characterizations.
Fields of Study & Subjects
Electron and X-Ray Spectroscopy Techniques
X-ray Spectroscopy and Fluorescence Analysis
Silicon and Solar Cell Technologies
Publication details
- Journal / source
- Surface and Interface Analysis
- Volume
- 58
- Issue
- 3
- Pages
- 186–192
- Publication date
- 2 January 2026
- Language
- EN