A Role of Electromigration at Nanostructuring of Thin Films During Deposition

Springer proceedings in physics 2026

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Authors: Alina V. Dvornichenko, Vasyl O. Kharchenko, Dmitrii O. Kharchenko, V. Borysiuk
DOI: 10.1007/978-3-031-99013-7_7
Cited by: 0
References: 78

Fields of Study & Subjects

Copper Interconnects and Reliability Optical Coatings and Gratings Theoretical and Computational Physics

Publication details

Journal / source
Springer proceedings in physics
Pages
105–122
Publication date
1 January 2026
Language
EN