Artificial neural network-driven diffraction imaging for nanoscale optical critical dimension metrology in semiconductor microstructures

The International Journal of Advanced Manufacturing Technology 2026

View at publisher
Authors: Fu-Sheng Yang, L. Chen, Chao-Ching Ho
DOI: 10.1007/s00170-025-17343-4
Cited by: 1
References: 26

Fields of Study & Subjects

Optical Coatings and Gratings Surface Roughness and Optical Measurements Advancements in Photolithography Techniques

Publication details

Journal / source
The International Journal of Advanced Manufacturing Technology
Publisher
Springer Science and Business Media LLC
Volume
142
Issue
7-8
Pages
3499–3525
Publication date
8 January 2026
Language
EN