Improving etchability and imaging performance of EUV mask absorber materials via ion implantation

Applied Physics A 2026

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Authors: Y.-H. Kim, Dongmin Jeong, Seungho Lee, Bom-Sok Kim, Myung-Jin Kim, Taeho Lee, Jinho Ahn

DOI: 10.1007/s00339-026-09450-0

Cited by: 0

References: 22

Fields of Study & Subjects

Advancements in Photolithography Techniques Advanced X-ray Imaging Techniques Optical Coatings and Gratings

References 22