A domain optimization approach for few-shot defect inspection on patterned wafer

Journal of Intelligent Manufacturing 2026

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Authors: Leisheng Chen, Kai Meng, Hangying Zhang, Yangyang Zou, Peihuang Lou, Xing Wu
DOI: 10.1007/s10845-026-02849-9
Cited by: 1
References: 42

Fields of Study & Subjects

Advancements in Photolithography Techniques Optical Coatings and Gratings Optical measurement and interference techniques

Publication details

Journal / source
Journal of Intelligent Manufacturing
Publisher
Springer Science and Business Media LLC
Publication date
10 April 2026
Language
EN