Analysis of activation energies in anisotropic wet etching of single-crystal silicon
Fields of Study & Subjects
Semiconductor materials and devices
Advanced Surface Polishing Techniques
Plasma Diagnostics and Applications
Publication details
- Journal / source
- Journal of Materials Science
- Volume
- 61
- Issue
- 7
- Pages
- 4515–4525
- Publication date
- 14 January 2026
- Language
- EN