The effect of magnetron sputtering process on the photoelectric properties of Zr-doped hafnium oxide thin films

Journal of Materials Science Materials in Electronics 2026

View at publisher

Authors: Zekui Zhang, Dan Zheng, Zhaoguang Huang, Kun Chen, Baoyuan Wang

DOI: 10.1007/s10854-026-16725-y

Cited by: 0

References: 16

Fields of Study & Subjects

Ferroelectric and Negative Capacitance Devices Semiconductor materials and devices Thin-Film Transistor Technologies

References 16