Spacer–Gate Synergy in Tri-Material FinFETs: Performance Analysis for RF/Analog Applications

Journal of Electronic Materials 2026

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Authors: R. Linie Sharon, A. Shirly Edward

DOI: 10.1007/s11664-026-12689-1

Cited by: 3

References: 39

Fields of Study & Subjects

Advancements in Semiconductor Devices and Circuit Design Semiconductor materials and devices Ferroelectric and Negative Capacitance Devices

References 39