Mechanism of Nitrogen Doping Concentration Drift in 4H-SiC Epitaxial Layers Induced by Ring Coating Thickness
Fields of Study & Subjects
Silicon Carbide Semiconductor Technologies
Diamond and Carbon-based Materials Research
GaN-based semiconductor devices and materials
Publication details
- Journal / source
- Journal of Electronic Materials
- Publisher
- Springer Science and Business Media LLC
- Volume
- 55
- Issue
- 4
- Pages
- 3936–3944
- Publication date
- 23 February 2026
- Language
- EN