Mechanism of Nitrogen Doping Concentration Drift in 4H-SiC Epitaxial Layers Induced by Ring Coating Thickness

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Authors: Weiliang Zhong, Jiahui Wang, Jiulong Wang, Yong Yao, Haifeng Yang, Pengxiang Hou, Le Yu, Zheyang Li, Rui Jin
Cited by: 2
References: 39

Fields of Study & Subjects

Silicon Carbide Semiconductor Technologies Diamond and Carbon-based Materials Research GaN-based semiconductor devices and materials

Publication details

Journal / source
Journal of Electronic Materials
Publisher
Springer Science and Business Media LLC
Volume
55
Issue
4
Pages
3936–3944
Publication date
23 February 2026
Language
EN