Atomic-Scale Material Removal Mechanisms in 3C-SiC Nano-Polishing: Molecular Dynamics Insights

Journal of Electronic Materials 2026

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Authors: Duo Li, Ruihan Li, Chao Long, Shuhao Kang, Huan LIU

DOI: 10.1007/s11664-026-12709-0

Cited by: 1

References: 52

Fields of Study & Subjects

Advanced Surface Polishing Techniques Silicon Carbide Semiconductor Technologies Advanced ceramic materials synthesis

References 52