Traditional and Energy-Field-Assisted Methods for Chemical Mechanical Polishing of Silicon Carbide: Mechanisms and Processability

International Journal of Precision Engineering and Manufacturing 2026

View at publisher
Authors: Yibo Wu, Shujing Wu, Dazhong Wang, Yirun Song, Jiapeng Chen, Jianbao Wu, Akiyama Takao
DOI: 10.1007/s12541-025-01442-z
Cited by: 0
References: 253

Fields of Study & Subjects

Advanced Surface Polishing Techniques Silicon Carbide Semiconductor Technologies Advanced machining processes and optimization

Publication details

Journal / source
International Journal of Precision Engineering and Manufacturing
Volume
27
Issue
5
Pages
2163–2197
Publication date
9 February 2026
Language
EN