Interfacial Engineering of WS₂ Thin-Film Transistors via O₂ Plasma-Induced WO3−x Buffer Layers

Electronic Materials Letters 2026

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Authors: J. W. Lee, Dong Hyun Seo, Gyeong Deok Seo, Tae-Wan Kim

DOI: 10.1007/s13391-026-00648-1

Cited by: 1

References: 42

Fields of Study & Subjects

2D Materials and Applications Thin-Film Transistor Technologies Nanowire Synthesis and Applications

References 42