Silicidation process at the NiMo/Si interface in magnetron-sputtered nano-multilayer systems depending the layer thickness and annealing temperature
Fields of Study & Subjects
Semiconductor materials and interfaces
Intermetallics and Advanced Alloy Properties
Copper Interconnects and Reliability
Publication details
- Journal / source
- Applied Surface Science
- Publisher
- Elsevier BV
- Volume
- 727
- Pages
- 165957–165957
- Publication date
- 18 January 2026
- Language
- EN