Silicidation process at the NiMo/Si interface in magnetron-sputtered nano-multilayer systems depending the layer thickness and annealing temperature

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Authors: E.O. Filatova, A.V. Solomonov, D.V. Danilov, S.S. Sakhonenkov
Cited by: 1
References: 67

Fields of Study & Subjects

Semiconductor materials and interfaces Intermetallics and Advanced Alloy Properties Copper Interconnects and Reliability

Publication details

Journal / source
Applied Surface Science
Publisher
Elsevier BV
Volume
727
Pages
165957–165957
Publication date
18 January 2026
Language
EN