Unveiling the atomistic wear process: how water mediates GaAs removal at the SiO2 interface

Applied Surface Science 2026

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Authors: SiSi Li, Xinyu Shen, Ruiqi Wang, Yuchen Gao, Yang Wang, Jian Gao, Chuan Tang, Chen Xiao

DOI: 10.1016/j.apsusc.2026.166186

Cited by: 0

References: 47

Fields of Study & Subjects

Advanced Surface Polishing Techniques Force Microscopy Techniques and Applications Laser Material Processing Techniques

References 47