A computational study for screening high-selectivity inhibitors in area-selective atomic layer deposition on amorphous surfaces

Applied Surface Science 2026

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Authors: Gijin Kim, Purun-hanul Kim, Suk Gyu Hahm, Myongjong Kwon, Byungha Park, ChangHo Hong, Seungwu Han
DOI: 10.1016/j.apsusc.2026.166294
Cited by: 2
References: 80

Fields of Study & Subjects

Semiconductor materials and devices Copper Interconnects and Reliability Semiconductor materials and interfaces

Publication details

Journal / source
Applied Surface Science
Publisher
Elsevier BV
Volume
730
Pages
166294–166294
Publication date
11 February 2026
Language
EN