Amorphous Hafnium-Aluminum Oxide and IGZO by Spray Pyrolysis for Low Power Thin Film Transistor Electronics

Applied Surface Science 2026

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Authors: Samiran Roy, Jewel Kumer Saha, Jin Jang
DOI: 10.1016/j.apsusc.2026.166327
Cited by: 1
References: 78

Fields of Study & Subjects

Thin-Film Transistor Technologies Silicon Carbide Semiconductor Technologies Semiconductor materials and devices

Publication details

Journal / source
Applied Surface Science
Publisher
Elsevier BV
Volume
730
Pages
166327–166327
Publication date
15 February 2026
Language
EN