Oxygen-source-driven dielectric and interface engineering of ALD Al2O3 for high-performance and stable p-type SnO thin-film transistors

Applied Surface Science 2026

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Authors: Peng Dai, Jialong Song, Chaoran Dong, Zening Gao, Junming Zhang, Yiming Wang, Jiawei Zhang, Yuxiang Li, Qian Xin, Aimin Song

DOI: 10.1016/j.apsusc.2026.166950

Cited by: 1

References: 31

Fields of Study & Subjects

Thin-Film Transistor Technologies ZnO doping and properties Semiconductor materials and devices

References 31