Polishing performance and Co–catalytic Fenton mechanism of a novel Fe3O4/MoS2 slurry for silicon carbide wafer chemical mechanical polishing

Applied Surface Science 2026

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Authors: Wangyang Li, Gong Lv, C Wang, Kaiyue Wang, Kaiyue Wang

DOI: 10.1016/j.apsusc.2026.167061

Cited by: 4

References: 37

Fields of Study & Subjects

Advanced Surface Polishing Techniques Advanced ceramic materials synthesis Diamond and Carbon-based Materials Research

References 37