Deep learning potential–driven insights into CF4 plasma etching of surface-terminated Si (0001) face of 4H-SiC

Applied Surface Science 2026

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Authors: Yuncai Jiang, Z W Li, Delin Kong, Shuangying Lei, Zai‐Fa Zhou

DOI: 10.1016/j.apsusc.2026.167653

Cited by: 1

References: 66

Fields of Study & Subjects

Silicon Carbide Semiconductor Technologies Diamond and Carbon-based Materials Research Advancements in Semiconductor Devices and Circuit Design

References 66