Effect of top electrode on interfacial layer formation and polarization switching kinetics in post-deposition annealed Hf0.5Zr0.5O2 capacitors

Current Applied Physics 2026

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Authors: Yu Bin Park, Tae Hyun Jung, Beomjun Kim, Jeonglyul Kim, J. I. Lee, Sang Won An, Chang-Su Woo, Beomjong Kim, Hyung‐Suk Jung, Hyobin Yoo, Sang Mo Yang
DOI: 10.1016/j.cap.2026.02.004
Cited by: 0
References: 39

Fields of Study & Subjects

Ferroelectric and Negative Capacitance Devices Semiconductor materials and devices Ferroelectric and Piezoelectric Materials

Publication details

Journal / source
Current Applied Physics
Volume
86
Pages
11–17
Publication date
12 February 2026
Language
EN