Stagnation point flow analysis in an inductively coupled plasma reactor for advanced deposition techniques

Chemical Engineering Journal 2026

View at publisher

Authors: Chanyeong Jeong, Sanghyun Jo, Ho Jun Kim

DOI: 10.1016/j.cej.2026.172713

Cited by: 1

References: 31

Fields of Study & Subjects

Plasma Diagnostics and Applications Copper Interconnects and Reliability Metal and Thin Film Mechanics

References 31