Electron-kinetic reactor engineering for damage-free, high-selectivity plasma etching

Chemical Engineering Journal 2026

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Authors: Min-Seok Kim, Yujin Yeo, Hyeon ho Nahm, Chin-Wook Chung

DOI: 10.1016/j.cej.2026.173989

Cited by: 2

References: 32

Fields of Study & Subjects

Plasma Diagnostics and Applications Copper Interconnects and Reliability Plasma Applications and Diagnostics

References 32