Reaction engineering of radical-molecular fluorine species in pulsed NF3 plasma for SiGe selective removal

Chemical Engineering Journal 2026

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Authors: Woo Chang Park, Hong Seong Gil, Dae Whan Kim, Doo San Kim, Yun Jong Jang, Ji Yeon Lee, Kyoung Chan Kim, Su Jeong Yang, Eun Seok Yoon, Jaejun Kim, Jaejik Baek, Kuntack Lee
+1 more Geun Young Yeom
DOI: 10.1016/j.cej.2026.176124
Cited by: 1
References: 48

Fields of Study & Subjects

Plasma Diagnostics and Applications Plasma Applications and Diagnostics Copper Interconnects and Reliability

Publication details

Journal / source
Chemical Engineering Journal
Publisher
Elsevier BV
Volume
537
Pages
176124–176124
Publication date
11 April 2026
Language
EN