Microstructure evolution of the 5 MeV Xe20+-implanted α-MoSi2 before and after annealing
Fields of Study & Subjects
Intermetallics and Advanced Alloy Properties
Semiconductor materials and interfaces
Titanium Alloys Microstructure and Properties
Publication details
- Journal / source
- Ceramics International
- Publisher
- Elsevier BV
- Volume
- 52
- Issue
- 8
- Pages
- 10266–10277
- Publication date
- 17 January 2026
- Language
- EN