Optimizing silicon-based metal-oxide-semiconductor capacitors via forming gas-oxygen-forming gas annealing of thulium oxide passivation layers
Fields of Study & Subjects
Semiconductor materials and devices
Semiconductor materials and interfaces
Silicon and Solar Cell Technologies
Publication details
- Journal / source
- Ceramics International
- Publisher
- Elsevier BV
- Volume
- 52
- Issue
- 8
- Pages
- 10659–10670
- Publication date
- 20 January 2026
- Language
- EN