Highly efficient inductively coupled plasma assisted chemical mechanical polishing of 4H-SiC wafers

Ceramics International 2026

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Authors: Bingyi Shen, Zhoulong Li, Zheng Gong, Bin Shen, Yongcheng Wang, Zhen Tong, Limin Zhu
DOI: 10.1016/j.ceramint.2026.01.348
Cited by: 5
References: 66

Fields of Study & Subjects

Advanced Surface Polishing Techniques Silicon Carbide Semiconductor Technologies Silicon and Solar Cell Technologies

Publication details

Journal / source
Ceramics International
Publisher
Elsevier BV
Volume
52
Issue
9
Pages
11902–11914
Publication date
24 January 2026
Language
EN