Crystallinity and stoichiometry engineering in TiO2 thin films via O3 post-treatment for enhanced dielectric properties

Ceramics International 2026

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Authors: Juan Hong, Hyeongjun Kim, Seokho Cho, Kyunghun Lyu, Soonbin Kwon, Keun-Young Shin, Woongkyu Lee

DOI: 10.1016/j.ceramint.2026.02.183

Cited by: 0

References: 51

Fields of Study & Subjects

Semiconductor materials and devices Copper Interconnects and Reliability Ferroelectric and Negative Capacitance Devices

References 51