Tuning the performance of dysprosium oxide thin film as a gate dielectric layer via annealing in concurrent flow of nitrogen and oxygen ambience

Ceramics International 2026

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Authors: Ming Xu, Junpeng Ren, Zhi Yao

DOI: 10.1016/j.ceramint.2026.02.208

Cited by: 0

References: 39

Fields of Study & Subjects

Semiconductor materials and devices Copper Interconnects and Reliability Ferroelectric and Negative Capacitance Devices

References 39