Effect of N2 plasma treatment on APS-Y2O3 coatings: CF4 plasma etching behavior and surface modification by Al- and N-containing layers

Ceramics International 2026

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Authors: Hyunho Yang, Minjin Lee, Kiin Choi, Gyutae Park, Hyun S. Kum
DOI: 10.1016/j.ceramint.2026.02.395
Cited by: 1
References: 28

Fields of Study & Subjects

Plasma Diagnostics and Applications Advanced ceramic materials synthesis Optical Coatings and Gratings

Publication details

Journal / source
Ceramics International
Publisher
Elsevier BV
Volume
52
Issue
12
Pages
18337–18349
Publication date
26 February 2026
Language
EN