Impact of capping layer engineering for ferroelectric and antiferroelectric hafnium aluminum oxides

Ceramics International 2026

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Authors: Hsuan-Han Chen, Hsiao‐Hsuan Hsu, Ruo-Yin Liao, Wu‐Ching Chou, Chun‐Hu Cheng

DOI: 10.1016/j.ceramint.2026.03.039

Cited by: 0

References: 22

Fields of Study & Subjects

Ferroelectric and Negative Capacitance Devices Semiconductor materials and devices Ferroelectric and Piezoelectric Materials

References 22