Atomic distributions at the interface of multilayer SiO2-PTFE thin films deposited via an alternate sputtering process
Fields of Study & Subjects
Ion-surface interactions and analysis
Semiconductor materials and devices
Copper Interconnects and Reliability
Publication details
- Journal / source
- Ceramics International
- Publisher
- Elsevier BV
- Volume
- 52
- Issue
- 14
- Pages
- 24796–24807
- Publication date
- 5 April 2026
- Language
- EN