Plasma-induced optimization of electron trapping for high-k charge trap memories: Mechanistic insights and modeling approaches

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Authors: Chan Hee Lee, So Won Kim, Hee Chul Lee
Cited by: 1
References: 53

Fields of Study & Subjects

Semiconductor materials and devices Plasma Diagnostics and Applications Silicon and Solar Cell Technologies

Publication details

Journal / source
Ceramics International
Publisher
Elsevier BV
Volume
52
Issue
14
Pages
26771–26781
Publication date
17 April 2026
Language
EN