Plasma-induced optimization of electron trapping for high-k charge trap memories: Mechanistic insights and modeling approaches
Fields of Study & Subjects
Semiconductor materials and devices
Plasma Diagnostics and Applications
Silicon and Solar Cell Technologies
Publication details
- Journal / source
- Ceramics International
- Publisher
- Elsevier BV
- Volume
- 52
- Issue
- 14
- Pages
- 26771–26781
- Publication date
- 17 April 2026
- Language
- EN