Multiscale modeling of area-selective atomic layer deposition of SiO2 on Al2O3 and SiO2 surfaces with intermediate etching steps

Chemical Engineering Science 2026

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Authors: Feiyang Ou, Abdulrahman Alghamdi, Chun-Pei Lin, Gerassimos Orkoulas, Panagiotis D. Christofides

DOI: 10.1016/j.ces.2026.123422

Cited by: 2

References: 29

Fields of Study & Subjects

Semiconductor materials and devices Copper Interconnects and Reliability Advancements in Photolithography Techniques

References 29