Dry development in lithography: Molecular design and chemical strategies
Fields of Study & Subjects
Advancements in Photolithography Techniques
Nanofabrication and Lithography Techniques
Copper Interconnects and Reliability
Publication details
- Journal / source
- Advances in Colloid and Interface Science
- Publisher
- Elsevier BV
- Volume
- 351
- Pages
- 103809–103809
- Publication date
- 3 February 2026
- Language
- EN