Dry development in lithography: Molecular design and chemical strategies

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Authors: Kangsik Lee, Juchan Chung, Hyo Jae Yoon
Cited by: 3
References: 50

Fields of Study & Subjects

Advancements in Photolithography Techniques Nanofabrication and Lithography Techniques Copper Interconnects and Reliability

Publication details

Journal / source
Advances in Colloid and Interface Science
Publisher
Elsevier BV
Volume
351
Pages
103809–103809
Publication date
3 February 2026
Language
EN