HOFLON: Hybrid Offline Learning and Online Optimization for process start-up and grade-transition control

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Authors: Alex Durkin, James Stolte, Mehmet Mercangöz
Cited by: 1
References: 17

Abstract

Start-ups and product grade-changes are critical steps in continuous-process plant operation, because any misstep immediately affects product quality and drives operational losses. These transitions have long relied on supervision by a handful of expert operators, but the progressive retirement of that workforce is leaving plant owners without the tacit know-how needed to execute them consistently. In the absence of a process model, offline reinforcement learning (RL) promises to capture — and even surpass — human expertise by mining historical start-up and grade-change logs, yet standard offline RL struggles with distribution-shift and value-overestimation whenever a learned policy ventures outside the data envelope. We introduce HOFLON (Hybrid Offline Learning + Online Optimization) to overcome those limitations. Offline, HOFLON learns (i) a latent data manifold that represents the feasible region spanned by past transitions and (ii) a long-horizon Q-critic that predicts the cumulative reward from state–action pairs. Online, it solves a one-step optimization problem that maximizes the Q-critic while penalizing deviations from the learned manifold and excessive rates of change in the manipulated variables. We test HOFLON on two industrial case studies—a polymerization reactor start-up and a paper-machine grade-change problem—and benchmark it against Implicit Q-Learning (IQL), a leading offline-RL algorithm. In both plants HOFLON not only surpasses IQL but also delivers on average better cumulative rewards compared to the best start-up or grade-change ever observed in the historical data, demonstrating its potential to automate transition operations beyond current expert capability.

Fields of Study & Subjects

Advanced Control Systems Optimization Process Optimization and Integration Machine Learning in Materials Science

Publication details

Journal / source
Computers & Chemical Engineering
Publisher
Elsevier BV
Volume
207
Pages
109566–109566
Publication date
16 January 2026
Language
EN