Simulation-guided AI-driven digital twin for plasma etching in semiconductor fabrication

Device 2026

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Authors: Sanghoon Myung, Kyeyeop Kim, Chanyoung Lee, Jinwoo Kim, Yunji Choi, Gijae Kang, Namhyun Kim, Bae Eun Jung, Jaejun Lee, Jiseong Doh, Kyu Baik Chang, Jaehyun Bae
+7 more Sun-Taek Lim, Seungmin Lee, Kwang-Yong Yang, Dohaing Lee, Keun Hee Bai, Dae Sin Kim, Jaehoon Jeong
DOI: 10.1016/j.device.2025.101026
Cited by: 0
References: 17

Fields of Study & Subjects

Plasma Diagnostics and Applications Model Reduction and Neural Networks Digital Transformation in Industry

Publication details

Journal / source
Device
Volume
4
Issue
3
Pages
101026–101026
Publication date
3 February 2026
Language
EN