Free-standing hybrid Zr/NGF filter for high-power EUV purification in EUV lithography
Fields of Study & Subjects
Advancements in Photolithography Techniques
Surface and Thin Film Phenomena
Electron and X-Ray Spectroscopy Techniques
Publication details
- Journal / source
- Diamond and Related Materials
- Publisher
- Elsevier BV
- Volume
- 165
- Pages
- 113661–113661
- Publication date
- 21 April 2026
- Language
- EN