Machine learning assisted multiphysics simulation for electroplating copper in high aspect ratio through silicon via
Fields of Study & Subjects
3D IC and TSV technologies
Electrodeposition and Electroless Coatings
Electronic Packaging and Soldering Technologies
Publication details
- Journal / source
- Electrochimica Acta
- Publisher
- Elsevier BV
- Volume
- 557
- Pages
- 148450–148450
- Publication date
- 16 February 2026
- Language
- EN