Molecular structures of composite corrosion inhibitors governing corrosion inhibition performance and material removal rate trend in chemical mechanical polishing of copper

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Authors: Yongshun Zhang, Liang Jiang, Yuting Wei, Liao Zhou, Jiaxin Zheng, Rongpei Wang, Xia Zhong, Shijie Zhao, Linmao Qian
Cited by: 1
References: 54

Fields of Study & Subjects

Advanced Surface Polishing Techniques Corrosion Behavior and Inhibition Material Properties and Applications

Publication details

Journal / source
Electrochimica Acta
Publisher
Elsevier BV
Volume
574
Pages
149324–149324
Publication date
11 June 2026
Language
EN