A gas flow prover for in-situ calibration of semiconductor process gases based on rate-of-rise method
Fields of Study & Subjects
Flow Measurement and Analysis
Advanced Sensor Technologies Research
Scientific Measurement and Uncertainty Evaluation
Publication details
- Journal / source
- Flow Measurement and Instrumentation
- Publisher
- Elsevier BV
- Volume
- 109
- Pages
- 103236–103236
- Publication date
- 31 January 2026
- Language
- EN