Optimized nickel doping boosts thermoelectric power factor in β-FeSi2 thin films
Fields of Study & Subjects
Semiconductor materials and interfaces
Advanced Thermoelectric Materials and Devices
Intermetallics and Advanced Alloy Properties
Publication details
- Journal / source
- International Communications in Heat and Mass Transfer
- Publisher
- Elsevier BV
- Volume
- 175
- Pages
- 111244–111244
- Publication date
- 11 April 2026
- Language
- EN