Temperature-governed lattice disorder, residual stress, and recovery in CVD 4H-SiC under Al implantation and annealing
Fields of Study & Subjects
Silicon Carbide Semiconductor Technologies
Silicon and Solar Cell Technologies
Thin-Film Transistor Technologies
Publication details
- Journal / source
- Journal of Alloys and Compounds
- Publisher
- Elsevier BV
- Volume
- 1054
- Pages
- 186279–186279
- Publication date
- 18 January 2026
- Language
- EN