Ultra-dilute electrodeposition of single-crystalline Cu nanostructures for nano-via interconnects
Fields of Study & Subjects
Electrodeposition and Electroless Coatings
Copper Interconnects and Reliability
Copper-based nanomaterials and applications
Publication details
- Journal / source
- Journal of Alloys and Compounds
- Volume
- 1057
- Pages
- 186719–186719
- Publication date
- 8 February 2026
- Language
- EN