Ultra-dilute electrodeposition of single-crystalline Cu nanostructures for nano-via interconnects

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Authors: J. I. Lee, Giho Jeong, Jinhee Song
Cited by: 0
References: 32

Fields of Study & Subjects

Electrodeposition and Electroless Coatings Copper Interconnects and Reliability Copper-based nanomaterials and applications

Publication details

Journal / source
Journal of Alloys and Compounds
Volume
1057
Pages
186719–186719
Publication date
8 February 2026
Language
EN