Formation and thickness-dependent resistivity scaling of C54-TiSi2, CoSi2, and NiSi thin films

Journal of Alloys and Compounds 2026

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Authors: Yi-Yen Chen, Guan-Ting Liu, Ting-Kan Tsai, Jau-Shiung Fang

DOI: 10.1016/j.jallcom.2026.188222

Cited by: 1

References: 49

Fields of Study & Subjects

Semiconductor materials and interfaces Copper Interconnects and Reliability Metallurgical and Alloy Processes

References 49