Study on the transport of phosphorus dopant during the n-type monocrystalline silicon growth by Czochralski technique

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Authors: Junling Ding, Haowen Yu, Zaoyang Li, Q. Chen, Pengfei Wang, Lijun Liu
Cited by: 2
References: 36

Fields of Study & Subjects

Silicon and Solar Cell Technologies Solidification and crystal growth phenomena Advanced Surface Polishing Techniques

Publication details

Journal / source
Journal of Crystal Growth
Publisher
Elsevier BV
Volume
679
Pages
128492–128492
Publication date
9 January 2026
Language
EN